Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component

dc.citation.issue21
dc.citation.volume12
dc.contributor.authorCadatal-Raduban M
dc.contributor.authorOlejníček J
dc.contributor.authorHibino K
dc.contributor.authorMaruyama Y
dc.contributor.authorPísaříková A
dc.contributor.authorShinohara K
dc.contributor.authorAsaka T
dc.contributor.authorLebedová Volfová L
dc.contributor.authorKohout M
dc.contributor.authorJiaqi Z
dc.contributor.authorAkabe Y
dc.contributor.authorNakajima M
dc.contributor.authorHarrison JA
dc.contributor.authorHippler R
dc.contributor.authorSarukura N
dc.contributor.authorOno S
dc.contributor.authorHubička Z
dc.contributor.authorYamanoi K
dc.date.accessioned2024-08-08T22:29:30Z
dc.date.available2024-08-08T22:29:30Z
dc.date.issued2024-05-10
dc.description.abstractUltrafast sub-100 picosecond luminescence is vital in many applications involving ultrafast events and time-of-flight systems. Materials exhibiting fast luminescence, such as barium fluoride (BaF2) and zinc oxide (ZnO), also suffer from an intrinsically slow nanosecond (ns) to microsecond (µs) luminescence. Here, 2.2 micrometer (µm)- to 5.7 µm-thick undoped ZnO films on soda-lime glass (SLG) substrates without a buffer layer by a hybrid pulsed reactive magnetron sputtering operating in the medium-frequency range (MF magnetron) assisted by an electron cyclotron wave resonance (ECWR) plasma is deposited. The undoped ZnO films exhibited superior optical properties characterized by intense ultraviolet (UV) luminescence, unprecedented ultrafast decay times, and for the case of MF+ECWR-deposited films, suppressed defect-related visible luminescence. The 2.2 µm-thick MF-deposited film exhibited the fastest 9-ps decay time at room temperature. The impressive properties of the films are attributed to the use of advanced deposition technology with properly tuned plasma parameters, especially a high degree of dissociation of molecular oxygen together with an increased proportion of activated zinc particles, leading to a higher deposition rate, better crystallinity, fewer defects, and a lower proportion of oxygen vacancies. These films will pave the way toward the development of time-of-flight detectors, high-resolution nuclear imaging cameras, and high-rate ultrafast timing devices.
dc.description.confidentialfalse
dc.edition.editionJul 2024
dc.identifier.citationCadatal-Raduban M, Olejníček J, Hibino K, Maruyama Y, Písaříková A, Shinohara K, Asaka T, Lebedová Volfová L, Kohout M, Jiaqi Z, Akabe Y, Nakajima M, Harrison JA, Hippler R, Sarukura N, Ono S, Hubička Z, Yamanoi K. (2024). Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component. Advanced Optical Materials. 12. 21.
dc.identifier.doi10.1002/adom.202400377
dc.identifier.eissn2195-1071
dc.identifier.elements-typejournal-article
dc.identifier.issn2195-1071
dc.identifier.number2400377
dc.identifier.urihttps://mro.massey.ac.nz/handle/10179/71239
dc.languageEnglish
dc.publisherWiley-VCH GmbH
dc.publisher.urihttps://onlinelibrary.wiley.com/doi/epdf/10.1002/adom.202400377
dc.relation.isPartOfAdvanced Optical Materials
dc.rights(c) 2024 The Author/s
dc.rightsCC BY 4.0
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleUltrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
dc.typeJournal article
pubs.elements-id488808
pubs.organisational-groupCollege of Health
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