Effect of Substrate and Thickness on the Photoconductivity of Nanoparticle Titanium Dioxide Thin Film Vacuum Ultraviolet Photoconductive Detector

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dc.citation.issue1
dc.citation.volume12
dc.contributor.authorCadatal-Raduban M
dc.contributor.authorKato T
dc.contributor.authorHoriuchi Y
dc.contributor.authorOlejníček J
dc.contributor.authorKohout M
dc.contributor.authorYamanoi K
dc.contributor.authorOno S
dc.contributor.editorSelim F
dc.contributor.editorWang Y
dc.coverage.spatialSwitzerland
dc.date.accessioned2024-01-30T01:12:45Z
dc.date.accessioned2024-07-25T06:50:58Z
dc.date.available2021-12-21
dc.date.available2024-01-30T01:12:45Z
dc.date.available2024-07-25T06:50:58Z
dc.date.issued2022-01
dc.description.abstractVacuum ultraviolet radiation (VUV, from 100 nm to 200 nm wavelength) is indispensable in many applications, but its detection is still challenging. We report the development of a VUV photoconductive detector, based on titanium dioxide (TiO2) nanoparticle thin films. The effect of crystallinity, optical quality, and crystallite size due to film thickness (80 nm, 500 nm, 1000 nm) and type of substrate (silicon Si, quartz SiO2, soda lime glass SLG) was investigated to explore ways of enhancing the photoconductivity of the detector. The TiO2 film deposited on SiO2 substrate with a film thickness of 80 nm exhibited the best photoconductivity, with a photocurrent of 5.35 milli-Amperes and a photosensitivity of 99.99% for a bias voltage of 70 V. The wavelength response of the detector can be adjusted by changing the thickness of the film as the cut-off shifts to a longer wavelength, as the film becomes thicker. The response time of the TiO2 detector is about 5.8 μs and is comparable to the 5.4 μs response time of a diamond UV sensor. The development of the TiO2 nanoparticle thin film detector is expected to contribute to the enhancement of the use of VUV radiation in an increasing number of important technological and scientific applications.
dc.description.confidentialfalse
dc.edition.editionJanuary 2022
dc.format.pagination10-
dc.identifier.author-urlhttps://www.ncbi.nlm.nih.gov/pubmed/35009959
dc.identifier.citationCadatal-Raduban M, Kato T, Horiuchi Y, Olejníček J, Kohout M, Yamanoi K, Ono S. (2021). Effect of Substrate and Thickness on the Photoconductivity of Nanoparticle Titanium Dioxide Thin Film Vacuum Ultraviolet Photoconductive Detector.. Nanomaterials (Basel). 12. 1. (pp. 10-).
dc.identifier.doi10.3390/nano12010010
dc.identifier.eissn2079-4991
dc.identifier.elements-typejournal-article
dc.identifier.issn2079-4991
dc.identifier.numberARTN 10
dc.identifier.piinano12010010
dc.identifier.urihttps://mro.massey.ac.nz/handle/10179/71004
dc.languageeng
dc.publisherMDPI (Basel, Switzerland)
dc.publisher.urihttps://www.mdpi.com/2079-4991/12/1/10
dc.relation.isPartOfNanomaterials (Basel)
dc.rights(c) 2021 The Author/s
dc.rightsCC BY 4.0
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subjectnanoparticle
dc.subjectphotoconductive detector
dc.subjectsemiconductor
dc.subjectthin film
dc.subjecttitanium dioxide
dc.subjectvacuum ultraviolet
dc.subjectwide band gap
dc.titleEffect of Substrate and Thickness on the Photoconductivity of Nanoparticle Titanium Dioxide Thin Film Vacuum Ultraviolet Photoconductive Detector
dc.typeJournal article
pubs.elements-id450154
pubs.organisational-groupOther
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